J. Chinn

PROFILE

Homepage
No homepage is listed.
ORCID
No ORCID is listed.
Affiliations
No affiliations are listed.
Aliases
J. Chinn, Jeff Chinn, J.d. Chinn, Jeff D. Chinn, J. D. Chinn, J Chinn, Jeffrey D. Chinn
Publication record
49 papers · 878 citations · H-index 12

PAPERS

Physicochemical Characteristics of an Ultra-Thin Hydrophobic Trichlorosilanes Using SiO2 as Adhesion
20190 citationsauthor #5
Characterization of Hydrophobic Silane Film Deposited on AISI 304 Stainless Steel for Corrosion Protection
20199 citationsauthor #5
Effect of [Tris(trimethylsiloxy)silyethyl]dimethylchlorosilane on the corrosion protection enhancement of hydrophobic film coated on AISI 304
20183 citationsauthor #5
Vapor-Phase Deposited Chlorosilane-Based Self-Assembled Monolayers on Various Substrates for Thermal Stability Analysis
20178 citationsauthor #2
"Insensitive" to touch: fabric-supported lubricant-swollen polymeric films for omniphobic personal protective gear.
201533 citationsauthor #8
Rapid method for testing efficacy of nano-engineered coatings for mitigating tin whisker growth
201511 citationsauthor #2
Dropwise Condensation of Low Surface Tension Fluids on Omniphobic Surfaces
2014199 citationsauthor #9
How nanorough is rough enough to make a surface superhydrophobic during water condensation
2012171 citationsauthor #3
How nanorough is rough enough? | NIST
20121 citationsauthor #3
3D aspects of droplet coalescence during dropwise condensation on superhydrophobic surfaces
20110 citationsauthor #4
Dynamics of nanoparticle self-assembly into superhydrophobic liquid marbles during water condensation.
201156 citationsauthor #2
Three dimensional aspects of droplet coalescence during dropwise condensation on superhydrophobic surfaces
2011100 citationsauthor #4
A NEXAFS Characterization of Vapor Deposited Monolayer and Submonolayer films on Si, SiO$_{2 }$and Al$_{2}$O$_{3}$
20100 citationsauthor #4
P‐56: Aligning Liquid Crystals Using Self‐Assembled Monolayers
20071 citationsauthor #5
Low Temperature Nanolayers of Metal Oxides By MVD
20072 citationsauthor #1
P-56 / A . Murauski P-56 : Aligning Liquid Crystals Using Self-Assembled Monolayers
20070 citationsauthor #5
Exceptional Wear Resistance of MEMS Devices Coated with Carbon-Doped Alumina Films
20073 citationsauthor #2
Choice of precursors in Vapor-phase Surface Modification
20062 citationsauthor #3
Vapor deposited release layers for nanoimprint lithography
20069 citationsauthor #6
An Improved Chemical Resistance and Mechanical Durability of Hydrophobic FDTS Coatings.
200623 citationsauthor #6
Reliability of Self-Assembled Hydrophobic Coatings: Chemical Resistance and Mechanical Durability
20062 citationsauthor #6
WTC 2005-64335 VAPOR DEPOSITION OF COMPOSITE ORGANIC-INORGANIC FILMS
20050 citationsauthor #2
Durable Anti-Stiction Coatings by Molecular Vapor Deposition (MVD)
200513 citationsauthor #2
Molecular vapor deposition (MVD/spl trade/) - a new method of applying moisture barriers for packaging applications
20058 citationsauthor #4
Molecular vapor deposition (MVD) for improved SAM coatings
20055 citationsauthor #2
Preparation of hydrophobic multilayers on solid surfaces
20050 citationsauthor #2
Molecular Vapor Deposition - An Improved Vapor-Phase Deposition Technique of Molecular Coatings for MEMS Devices
20048 citationsauthor #6
Improved vapor-phase deposition technique for antistiction monolayers
200410 citationsauthor #3
Interferometry for end point prediction during plasma etching of various structures in complementary metal–oxide–semiconductor device fabrication
19998 citationsauthor #7
WSi/sub x//poly-Si gate stack etching for advanced dRAM applications
19991 citationsauthor #8
Interferometry for endpoint prediction in gate etching
19993 citationsauthor #8
Sidewall angle measurements using CD SEM
199812 citationsauthor #4
EVALUATION OF PLASMA CHARGING DAMAGE DURING POLYSILICON GATE ETCHING PROCESS IN A DECOUPLED PLASMA SOURCE REACTOR
199833 citationsauthor #3
The potential of using refractory metals and barrier layers to generate high temperature interconnects
19882 citationsauthor #5
Magnetron-plasma ion beam etching: A new dry etching technique
19882 citationsauthor #1
Ion beam enhanced magnetron reactive ion etching
19871 citationsauthor #1
The significance of reactive ions and reactive neutrals in ion‐beam‐assisted etching
198512 citationsauthor #1
Ion Beam Etching of Silicon, Refractory Metals, and Refractory Metal Silicides Using a Chemistry Assisted Technique
198410 citationsauthor #1
PROFILE FORMATION IN CAIBE.
198412 citationsauthor #1
CHARACTERIZATION OF REACTIVE ION BEAM AND ION BEAM ASSISTED ETCHING USING DIRECT ION MASS ANALYSIS AND EMISSION SPECTROSCOPY.
19840 citationsauthor #1
Dry etching for submicron structures
19845 citationsauthor #3
Advanced submicron research and technology development at the national submicron facility
19832 citationsauthor #5
DRY ETCHING OF MATERIALS USED IN VLSI CIRCUITS.
19830 citationsauthor #3
Chemically assisted ion beam etching of GaAs, Ti, and Mo
198332 citationsauthor #1
Chemically assisted ion beam etching for submicron structures
198317 citationsauthor #1
Profile control by chemically assisted ion‐beam and reactive ion beam etching
198310 citationsauthor #1
Dry development of ion beam exposed PMMA resist
198224 citationsauthor #2
Reactive ion etching for submicron structures
198115 citationsauthor #1
Experimental Determination of the Static Properties of a Towable VHF-UHF Horizontal Electrode Antenna
19790 citationsauthor #3

TIMELINE

1979 0 citations

1981 15 citations

1982 24 citations

1983 61 citations

1984 27 citations

1985 12 citations

1987 1 citations

1988 4 citations

1998 45 citations

1999 12 citations

2004 18 citations

2005 26 citations

2006 36 citations

2007 6 citations

2010 0 citations

2011 156 citations

2012 172 citations

2014 199 citations

2015 44 citations

2017 8 citations

2018 3 citations

2019 9 citations

J. Chinn

PROFILE

PAPERS

TIMELINE

COAUTHOR MAP

CONCEPT FOOTPRINT