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Plasma deposited high density amines on surface using (3-aminopropyl)triethoxysilane for assembling particles at near-nano size

X. Rao,Ali Hassan,C. Guyon,S. Ognier,M. Tatoulian

Published 2020 in Materials Chemistry and Physics

ABSTRACT

Abstract Although solid particles assembling on substrate surface is one of the key points for developing membrane reactors, the technology of organizing nano/near nanometer building blocks into complex structures is still a challenge to scientists in years. In this work, amine functional groups were deposited on the surface of different substrates via plasma enhanced chemical vapor deposition (PECVD) technology and (3-aminopropyl)triethoxysilane monomers were used as precursors. The influence of active gas, substrates, as well as deposition time on the physico-chemical features of as-deposited film were investigated, respectively. The highest density of amine of 5.5% on surface was obtained when Ar was utilized as active gas and deposition time was 40 s. Furthermore, Y type zeolite particles at near-nano size were synthesized and subsequently used as a model material for testing the immobilizing ability of plasma treated surface. The results clearly confirmed that a dense mono or multi-layer of closely packed zeolite particles could be formed on the APTES as-deposited surface after 24 h’ immersion and the surface area of substrate could be improved by the deposition of zeolite.

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