Robust Industrial Localization of Dot-Pattern Data Matrix Codes on Metallic Surfaces

Chungang Han,Yipeng Liu,Jinyong Yu

Published 2025 in 2025 IEEE 4th Industrial Electronics Society Annual On-Line Conference (ONCON)

ABSTRACT

Dot-pattern Data Matrix (DM) codes engraved or printed on metallic surfaces are widely deployed in industrial inspection and traceability pipelines. However, reliably localizing their dot structures remains challenging due to specular reflections, surface roughness, machining artifacts, and local damage. We propose a hybrid deepgeometric localization framework integrating YOLOv10-based dot detection with subpixel geometric refinement and projective grid reconstruction. First, YOLOv10 robustly detects dot candidates under severe illumination disturbances. A sub-pixel refinement module further enhances geometric precision by combining intensity-weighted centroid estimation and Taubin circle fitting. To suppress false detections arising from scratches or metallic noise, a geometric consistency filter based on inter-dot distance statistics and density clustering is applied. Subsequently, a RANSAC-based homography estimation aligns the detected dots with an ideal DM template for global grid reconstruction. Missing dots caused by reflections or damage are recovered using a reprojection-driven completion strategy. Experiments on real-world industrial metal datasets show that the proposed method significantly improves localization accuracy, grid completeness, and decoding robustness compared with deep-learning-only and geometry-only baselines.

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