In situ real-time monitoring of profile evolution during plasma etching of mesoporous low-dielectric-constant SiO2

No abstract is available for this paper.

• Publication year

  2005

• Venue

  Journal of Vacuum Science and Technology

• Publication date

  2005-03-01

• Fields of study

  Materials Science, Engineering

• Identifiers
  DOI 10.1116/1.1865154
• External record

  Open on Semantic Scholar

• Source metadata

  Semantic Scholar

• No claims are published for this paper.

• No concepts are published for this paper.

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