A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination

No abstract is available for this paper.

• Publication year

  2013

• Venue

  Surface & Coatings Technology

• Publication date

  2013-10-15

• Fields of study

  Materials Science, Engineering

• Identifiers
  DOI 10.1016/J.SURFCOAT.2013.05.035
• External record

  Open on Semantic Scholar

• Source metadata

  Semantic Scholar

• No claims are published for this paper.

• No concepts are published for this paper.

• Magnetron sputter deposition as visualized by Monte Carlo modeling

  2012cited by this paper
• Magnetron sputter deposition: Linking discharge voltage with target properties

  2009cited by this paper
• Towards a more complete model for reactive magnetron sputtering

  2007cited by this paper
• Control of reactive sputtering processes

  2005cited by this paper
• Fundamental understanding and modeling of reactive sputtering processes

  2005cited by this paper
• Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture

  2002cited by this paper
• Predicting thin‐film stoichiometry in reactive sputtering

  1988cited by this paper
• Effect of N2Ar mixing on the reactive sputtering characteristics of silicon

  1983cited by this paper

• Analysis of Metallic-to-Oxide Sputtering Mode Transition During Reactive Magnetron Deposition of Aluminum Oxide Coatings

  2025cites this paper
• Reactive magnetron sputtering of copper oxide coatings using the metallic mode assisted by RF-ICP source: Experiment and calculation

  2025cites this paper
• Assistance to Determine the Stability State of a Reactive Sputtering Process Based on the Analytical Solution of the Classical Berg Model

  2025cites this paper
• Surface temperature of a 2 in. Ti target during DC magnetron sputtering

  2024cites this paper
• Physicochemical model for reactive sputtering of a sandwich target

  2023cites this paper
• PVD for Decorative Applications: A Review

  2023cites this paper
• Modeling of Reactive Sputtering—History and Development

  2023cites this paper
• Modeling and Experimental Study of Hysteresis during the Reactive Sputter Deposition of Titanium Oxides and Nitrides Using a Pulsed DC Magnetron

  2022cites this paper
• Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering

  2022cites this paper
• Study of deposition parameters of reactive-sputtered Si3N4 thin films by optical emission spectroscopy

  2022cites this paper
• Tuning of the silicon nitride refractive index by RF sputtering power

  2021cites this paper
• Tuning silicon nitride refractive index through radio-frequency sputtering power

  2021cites this paper
• Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

  2020cites this paper
• Protected silver coatings for reflectors

  2019cites this paper
• International Conference on Space Optics — ICSO 2018 Chania , Greece 9 – 12 October 2018

  2019cites this paper
• Protected silver coatings for reflectors

  2019cites this paper
• An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

  2018cites this paper
• Tutorial: Hysteresis during the reactive magnetron sputtering process

  2018cites this paper
• Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films

  2018cites this paper
• Anomalous effects in the aluminum oxide sputtering yield

  2018cites this paper
• Physicochemical model for reactive sputtering of hot target

  2017cites this paper
• High-Pressure and Reactive Gas Magnetron Sputtering

  2017cites this paper
• Modelling of hot target reactive sputtering

  2017cites this paper
• Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Model

  2017cites this paper
• Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

  2017cites this paper
• Temperature dependence of electrical resistivity in oxidized vanadium films grown by the GLAD technique

  2016cites this paper
• Effect of discharge power on target poisoning and coating properties in reactive magnetron sputter deposition of TiN

  2016cites this paper
• Tunable Optical Properties of SiNx Thin Films by OES Monitoring in a Reactive RF Magnetron Plasma

  2016cites this paper
• The existence of a double S-shaped process curve during reactive magnetron sputtering

  2016cites this paper
• Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering

  2016cites this paper
• Modeling and experiments of N-doped vanadium oxide prepared by a reactive sputtering process

  2015cites this paper
• Simulation of how pressure influences the reactive sputtering process

  2015cites this paper
• Modeling the reactive sputter deposition of Ti-doped VO x thin films

  2015cites this paper
• High-rate sputtering deposition of high- and low-refractive index films from conductive composites

  2015cites this paper
• Hysteresis-free high rate reactive sputtering of niobium oxide, tantalum oxide, and aluminum oxide

  2014cites this paper
• Upgrading the “Berg-model” for reactive sputtering processes

  2014cites this paper
• Influencing the hysteresis during reactive magnetron sputtering by gas separation

  2013cites this paper