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Photoelectrochemical Behavior of n‑type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition
N. Strandwitz,D. J. Comstock,R. Grimm,Adam C. Nichols-Nielander,J. Elam,N. Lewis
Published 2013 in Journal of Physical Chemistry C
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- Publication year
2013
- Venue
Journal of Physical Chemistry C
- Publication date
2013-03-01
- Fields of study
Materials Science, Chemistry
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