Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma

Khant Nyar Paing,Takeshi Aizawa,Hiroto Nishioka,Masashi Yamamoto,Tasuku Sakurai,Bat-Orgil Erdenezaya,Yusuke Kayamori,Y. Nakano,Yasunori Tanaka,T. Ishijima

Published 2022 in Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)

ABSTRACT

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PUBLICATION RECORD

Publication year
2022
Venue
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
Publication date
2022-12-16
Fields of study
Not labeled
Identifiers
DOI 10.2494/photopolymer.35.371
External record
Open on Semantic Scholar
Source metadata
Semantic Scholar

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