Comparison of profile tailing in SIMS analyses of various impurities in silicon using nitrogen, oxygen, and neon ion beams at near-normal incidence

No abstract is available for this paper.

• Publication year

  1990

• Venue

  Applied Physics A

• Publication date

  1990-04-01

• Fields of study

  Materials Science, Physics, Chemistry

• Identifiers
  DOI 10.1007/BF00323600
• External record

  Open on Semantic Scholar

• Source metadata

  Semantic Scholar

• No claims are published for this paper.

• No concepts are published for this paper.

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