High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering

Multilayer structures of TiO2/Ag/TiO2 have been deposited onto flexible substrates by room temperature sputtering to develop indium-free transparent composite electrodes. The effect of Ag thicknesses on optical and electrical properties and the mechanism of conduction have been discussed. The critical thickness (tc) of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm. The Haacke figure of merit (FOM) for tc has one of the highest FOMs with 61.4 × 10−3 Ω−1/sq.

• Publication year

  2013

• Venue

  APL Materials

• Publication date

  2013-06-06

• Fields of study

  Materials Science, Physics, Engineering

• Identifiers
  DOI 10.1063/1.4808438
• External record

  Open on Semantic Scholar

• Source metadata

  Semantic Scholar

• No claims are published for this paper.

• No concepts are published for this paper.

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